In reactive sputtering process with an Ar + O₂ gas mixture, the plasma emission observed near the cathode changes in appearance. When the oxygen content is high, the plasma exhibits a reddish-violet ...
Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor deposition (PVD) process for the ...
Sputtering is a well-known physical vapor deposition (PVD) method finding use in several product applications. While commercial sputter systems are designed for large scale production volume of proven ...
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