Si2 announced that Cadence has donated extensions to the OpenAccess community which enable physical design tools to represent Multi-Patterned Technology (MPT). Conventional photolithography cannot ...

Introduction of the breakthrough "s" series features, extending DUV light source performance, enhancing availability and reducing operating costs. SPIE Advanced Lithography 2012 - OYAMA, ...

Cutting-edge lithography to create smaller features increasingly is being supplemented by improvements in lithography for mature process nodes, both of which are required as SoCs and complex chips are ...

Lithography scanner light source provider demonstrates capability for the future generation of larger wafers. OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source ...

With the ongoing US-China tensions, Huawei exemplified its ability to make 7nm chips without EUV equipment, and chip guru Burn Lin believes it's not surprising for Huawei to achieve the milestone, but ...

Researchers, equipment vendors, and manufacturers alike are watching with growing concern as we creep every closer to the end of 193 nm optical lithography. The problem is not that there are no ...

In a milestone for the global semiconductor industry, Multibeam Corp. today introduced the MB platform, a first-of-a-kind Multicolumn E-Beam Lithography (MEBL) to make chip factories better. Their new ...

Experts at the Table: As leading-edge lithography nodes push further into EUV and beyond, mask-making has become one of the most critical and costly aspects of semiconductor manufacturing. At the same ...

When we talk about computing these days, we tend to talk about software and the engineers who write it. But we wouldn’t be anywhere without the hardware and the physical sciences that have enabled it ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...