After years in R&D, several fab tool vendors last year finally began to ship systems based a next-generation technology called atomic layer etch (ALE). ALE is is moving into 16/14nm, but it will play ...
TOKYO, Nov 28, 2024 - (JCN Newswire) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its DCR(1) Etch System 9060Series. This system, which leverages Hitachi ...
What is Atomic Layer Etching? Atomic layer etching (ALE) is a highly controlled and selective etching technique that removes material layer by layer at the atomic scale. It is a cyclic process that ...
Several etch vendors are starting to ship next-generation selective etch tools, paving the way for new memory and logic devices. Applied Materials was the first vendor to ship a next-gen selective ...
The PE-100 Convertible plasma system incorporates reactive ion etching and isotropic etching/cleaning technologies into a stand-alone benchtop system. The all aluminum chamber has over 240 in. 2 of ...
An example of directional etching for nanohole arrays of less than 500nm in diameter. (Image: A*STAR Institute of Materials Research and Engineering) Wet etching can be classified into two main types ...
Silicon nitride (Si3N4) etching is a critical process step in the fabrication of three-dimensional NAND flash memories, where vertically stacked layers demand exceptional process precision. The ...
(MENAFN- JCN NewsWire) Hitachi High-Tech Launches DCR Etch System 9060 Series, Supporting Isotropic Etching of Advanced 3D Devices at the Atomic Level TOKYO, Nov 28, 2024 - (JCN Newswire) - Hitachi ...
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